Honorary Chair :

Xun Hou                         Xi'an Jiaotong University, China

Yue Hao                           Xidian University, China

Fengyi Jiang                    Nanchang University, China

Rong Zhang                    Xiamen University, China

Hiroshi Kawarada            Waseda University, Japan

Shiro Sakai                      The University of Tokushima, Japan

Yasuo KoideNational        Institute for Material Science, Japan

Yonhua Tzeng                  Cheng Kung University, Taiwan

Qunji Xue                          Ningbo Institute of Material Technology and Engineering,CAS, China

Zhanguo Wang                 Institute of Semiconductors,CAS, China

Chair :

Hong-Xing Wang               Xi'an Jiaotong University, China

Co-Chair：

Zhihong Feng                   National Key Laboratory of ASIC,HSRI, China

Bo Shen                            Peking University, China

Chengming Li                   University of Science and Technology Beijing, China

Guangchao Chen             CAS University, China

Hongdong Li                    Jilin University, China

Jinping Ao                        The University of Tokushima, Japan

Meiyong Liao                    National Institute for Material Science, Japan

Nan Jiang                         Ningbo Institute of Material Technology and Engineering,CAS, China

Nianjun Yang                    Institute of Materials Engineering, University of Siegen, Germany

Ping Yang                         Jinan University, China

Renan Bu                         Xi'an Jiaotong University, China

Weiguo Liu                       Xi'an Technological University,China